Grain manipulation for increased sputtering thickness
“Magnetically Enhanced” targets have been developed to optimize the PTF of our magnetic targets. This improvement has been achieved through grain manipulation of our magnetic materials. ME™ grade targets allow our customers to sputter magnetic materials at an increased thickness, as well as increase the deposition rate at the original thickness.
In addition, the increased PTF may help stabilize the plasma, which will result in improved film uniformity. These benefits have been implemented without sacrificing consistently fine grain size and are verified using our internal PTF measurement device. ME™ grade targets are available for all target configurations.
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